High-Loft Nonwoven Fabric, US Patent No. D0226048

High-Loft Nonwoven Fabric, US Patent No. D0226048, page 1
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A one-page US design patent (Des. 226,048) for the ornamental design of a high-loft nonwoven material, granted January 16, 1973 to Kimberly-Clark Corporation. The figures show a diamond-like repeat pattern in plan view, and Fig. 2 shows it vertically stretched. It includes the single design claim and references cited.

Type
Patent
Date
January 16, 1973
Language
English
Pages
1
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From Ralph Griswold's Digital Archive, delivered by the University of Arizona.
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