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High-Loft Nonwoven Fabric, US Patent No. D0226048
High-Loft Nonwoven Fabric, US Patent No. D0226048
Patent · 1 page
A one-page US design patent (Des. 226,048) for the ornamental design of a high-loft nonwoven material, granted January 16, 1973 to Kimberly-Clark Corporation. The figures show a diamond-like repeat pattern in plan view, and Fig. 2 shows it vertically stretched. It includes the single design claim and references cited.

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